In this study, the impacts of the foliar application of different sodium nitroprusside (SNP, as a donor of nitric oxide) concentrations (0-300 µM) on two sorghum varieties (Sorghum bicolor L. Albanus and Sorghum bicolor L. Shamal) under salt stress (150 mM NaCl) were investigated. The data revealed that salinity leads to an increase in oxidative stress markers and damage of the membrane integrity, accompanied by a decrease in the chlorophyll content, the open photosystem II (PSII) centers, and the performance indexes (PI ABS and PI total), as well as having an influence on the electron flux reducing photosystem I (PSI) end acceptors (REo/RC). Spraying with SNP alleviated the NaCl toxicity on the photosynthetic functions; the protection was concentration-dependent, and greater in Shamal than in Albanus, i.e., variety specific. Furthermore, the experimental results revealed that the degree of SNP protection under salt stress also depends on the endogenous nitric oxide (NO) amount in leaves, the number of active reaction centers per PSII antenna chlorophylls, the enhanced electron flux reducing end acceptors at the acceptor side of PSI, as well as the stimulation of the cyclic electron transport around PSI. The results showed better protection in both varieties of sorghum for SNP concentrations up to 150 µM, which corresponds to about a 50% increase in the endogenous NO leaf content in comparison to the control plants. Our study provides valuable insight into the molecular mechanisms underlying SNP-induced salt tolerance in sorghum varieties and might be a practical approach to correcting salt intolerance.